For R&D and failure evaluation in nanofabrication.
Picture Credit score:Quantum Design
The Vista 300 from Molecular Vista is a nano IR instrument focused for superior semiconductor course of monitoring and defect evaluation.
Vista 300 combines an atomic pressure microscope with infrared spectroscopy to offer Picture-induced Power Microscopy (PiFM), a way that performs chemical mapping with a spatial decision of
A outstanding demonstration of PiFM is proven within the accompanying pictures – PiFM is ready to map the chemical variations between uncovered and unexposed 16 nm half-pitch patterns in EUV resist earlier than the resist is developed. AFM topography reveals no trace of the uncovered sample, however PiFM detects the chemical modifications brought on by EUV publicity.
Vista 300 is designed to deal with full 300 mm wafers however does so in a minimal footprint of only one.1 x 1.1 m2. The instrument is totally developed and prepared for rapid orders. Demonstrations of Vista 300 on buyer wafers or different pattern can be found by contacting Dr. Shayz Ikram under.
In 2015, MVI was the primary firm to display AutoPiFM functionality identifies supplies and generates chemical maps and chemical fingerprint spectra with minimal person enter required. Sit again and let AutoPiFM do the work! Likewise, MVI’s new AutoAlign system mechanically and optimally focuses the IR optical beam on the AFM tip, eliminating the necessity for the person to be taught the main points of optical alignment. These options make PiFM totally accessible to laboratory or manufacturing technicians.
With extra superior semiconductor processes depending on atomically skinny natural and dielectric layers with more and more smaller characteristic sizes, Vista 300 is an ideal hybrid topography and chemical metrology instrument for characterising Excessive NA EUV lithography, selective atomic layer deposition, Cu-Cu hybrid bonding processes, and sub-100 nm defects.
Dr. Sung Park, CEO of Molecular Vista